Film formation technology "vacuum deposition"
The high reliability of vacuum deposition technology and the diversity of optical products that arise from it.
Vacuum deposition is a film formation technology that involves heating the deposition material in a high vacuum to vaporize it. The vaporized material, now in gas form, collides with and adheres to a substrate, resulting in the formation of a deposited thin film. This principle is similar to when a plate is brought over steam that is boiling and evaporating, causing the evaporated water to adhere to the plate. By varying the combinations of refractive index, thickness, and number of layers of dielectric and metallic deposition materials, it is possible to control the transmission, reflection, and absorption of light (ultraviolet, visible, and infrared). 【Features】 ■ Capable of film formation on glass, plastic, film, metal, etc. ■ Deposition materials include metal oxides (ZrO2, Al2O3, TiO2, SiO2, etc.) and metals (Al, Cr, Ti, Sn, Au, Ag, etc.) ■ Use of continuous vacuum deposition equipment enhances quality and productivity ■ Film formation in high vacuum improves the adhesion and quality of the deposited film *For more details, please download the PDF or feel free to contact us.
- Company：エツミ光学 大野工場
- Price：Other
